article
Extraction of highly directional electron beam in capacitively coupled plasma with fast-rising positive pulse bias
1 May 2026
Indexed reference — no copy held
This work is indexed here by title and author because the archive refers to it. Its text is still in copyright and is not reproduced.
Abstract
A simulation study, not an experiment: two-dimensional particle-in-cell modelling of a capacitively coupled radio-frequency plasma onto which a single fast-rising positive voltage pulse is superposed, to pull electrons out of the plasma as a directed beam. The finding that matters here is which knob does what. The rise time of the pulse governs the energy and the directionality of the extracted electrons, through the strength of the field reversal it causes; one nanosecond ga...
Physics of Plasmas 33, 053509 (2026). Seoul National University, Department of Nuclear Engineering.
DOI 10.1063/5.0302822 · AIP Publishing
Why it is here
A simulation study, not an experiment: two-dimensional particle-in-cell modelling of a capacitively coupled radio-frequency plasma onto which a single fast-rising positive voltage pulse is superposed, to pull electrons out of the plasma as a directed beam. The finding that matters here is which knob does what. The rise time of the pulse governs the energy and the directionality of the extracted electrons, through the strength of the field reversal it causes; one nanosecond gave the most directional beam. The pulse's on-time hardly matters. Too large an amplitude pulls out weakly directional electrons that do no useful work and leaves a voltage offset that recovers slowly and distorts the ion energies afterwards.
It is kept because Meyer's gas processor and his "electron extractor" claim the same thing in his own vocabulary: a pulsed positive voltage field pulling orbital electrons off gas atoms so they cannot return, with the pulse's shape doing the work rather than its duration. The paper is a modern, quantified statement of what a fast-rising positive pulse does to electrons at a plasma boundary, with the trade-offs Meyer never wrote down. The context is semiconductor etching; the physics is not.
Provenance
- Shelf
- Reference Library
- Doi
- 10.1063/5.0302822
- Author
- Junbeom Park, YeongHwan Choi, Jiseong Nam, Kyoungsoo Chung, Si Young Koh and Kyoung-Jae Chung
- Patent office record
- pubs.aip.org →
- Rights
- Published in 2026 and in copyright. Indexed here by title, authors and citation, with the archive's own note on why it is kept; the text is not reproduced.
- Citation
- Physics of Plasmas 33, 053509 (2026). Seoul National University, Department of Nuclear Engineering.
- Collected By
- the archive