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• Controlled Process for the Production of Thermal Energy from Gases and Apparatus Useful Therefor from the source record
• Method for manufacturing semiconductor structure from the source record

  Cited by the examiner during prosecution

• Plasma generator and film forming method employing same from the source record

  Cited by the examiner during prosecution

• Fabrication of photovoltaic cell by plasma process from the source record

  Cited by the applicant

• Production apparatus of semiconductor layer employing DC bias and VHF power from the source record

  Cited by the examiner during prosecution

• Method and arrangement for plasma boronizing from the source record

  Cited by the applicant

• Plasma boronizing from the source record

  Cited by the examiner during prosecution

• Method for manufacturing semiconductor structure from the source record

  Cited by the examiner during prosecution

• Plasma generating device and film deposition method in which the plasma generating device is used from the source record

  Cited by the examiner during prosecution

• Deposited Film Forming Method, Deposited Film Forming Device, Deposited Film, and Photosensitive Member Provided with the Deposited Film from the source record

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• Deposition of semiconductor layer by plasma process from the source record

  Cited by the applicant

• Plasma boronizing from the source record

  Cited by the examiner during prosecution

• Method of growing an amorphous silicon film from the source record

  Cited by the examiner during prosecution

• Process for carburizing carburisable work pieces under the action of plasma-pulses from the source record

  Cited by the examiner during prosecution

• Apparatus for selective chemical vapor deposition of dielectric, semiconductor and conductive films on semiconductor and metallic substrates from the source record

  Cited by the examiner during prosecution

• Process for deposition of a protective coating based on amorphous diamond pseudocarbon or on modified silicon carbide from the source record

  Cited by the examiner during prosecution

• Thin film capacitor and apparatus for manufacturing same from the source record

  Cited by the examiner during prosecution

• Process and apparatus for coating a substrate in a plasma from the source record

  Cited by the examiner during prosecution

• Process for preparation of semiconductor device from the source record

  Cited by the examiner during prosecution

• Controlled process for the production of thermal energy from gases and apparatus useful therefor from the source record

  Cited by the examiner during prosecution

• Process and apparatus for depositing hydrogenated amorphous silicon on a substrate in a plasma environment from the source record

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• Plasma deposition of amorphous metal alloys from the source record

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• Controlled Process For The Production Of Thermal Energy From Gases And Apparatus Useful Therefore from the source record

  Cited by the examiner during prosecution

• Process And Apparatus For The Production Of Fuel Gas And The Enhanced Release Of Thermal Energy From Such Gas found in the text

  “…84]. Further processes are also described in United States patents 4,233,109; 4,406,765; 4,687,753 and 4,695,357. The process and apparatus described herein are considered…”

• Process & Apparatus For The Production Of Fuel Gas & The Enhanced Release Of Thermal Energy From Such Gas found in the text

  “…July, 1987, page 84]. Further processes are also described in U.S. Pat. Nos. 4,233,109; 4,406,765; 4,687,753 and 4,695,357. The process and apparatus described herein are considered…”

• Controlled Process For The Production Of Thermal Energy From Gases And Apparatus Useful Therefore from the source record

References

cites 5

• Method of depositing uniform films of Six Ny or Six Oy in a plasma reactor from the source record
• Method of forming semiconducting materials and barriers from the source record
• Process for depositing elemental silicon semiconductor material from a gas phase from the source record
• Method of powder activation from the source record
• Producing rod-shaped semiconductor crystals from the source record