What’s new

August 2026

• patent · 15 Mar 2007 · added 2 months ago

  Method for manufacturing printing plate

• patent · 7 Dec 2006 · added 2 months ago

  Polarizer based on a nanowire grid

• patent · 17 Mar 2005 · added 2 months ago

  Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method

• patent · 20 Jan 2005 · added 2 months ago

  Ion beam method for removing an organic light emitting material

• patent · 18 Mar 2004 · added 2 months ago

  Atmospheric pressure plasma assembly

• patent · 16 Dec 2003 · added 2 months ago

  Bonded substrate structures and method for fabricating bonded substrate structures

• patent · 13 Feb 2003 · added 2 months ago

  Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same

• patent · 10 Dec 2002 · added 2 months ago

  Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls

• patent · 12 Sep 2002 · added 2 months ago

  Dry etching apparatus, etching method, and method of forming a wiring

• patent · 15 Nov 2001 · added 2 months ago

  Semiconductor device and manufacturing method thereof

• patent · 3 Oct 2000 · added 2 months ago

  Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls

• patent · 6 Jun 2000 · added 2 months ago

  Plasma processing system

• patent · 11 Apr 2000 · added 2 months ago

  Plasma etch reactor and method for emerging films

• patent · 4 Apr 2000 · added 2 months ago

  Aluminum hole filling method using ionized metal adhesion layer

• patent · 5 Oct 1999 · added 2 months ago

  Semiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenches

• patent · 13 Oct 1993 · added 2 months ago

  Method and apparatus for producing variable spatial frequency control in plasma assisted chemical etching

• patent · 9 Sep 1986 · added 2 months ago

  Apparatus for processing semiconductor wafers or the like

  Machine transcription of the US4610748A patent scan, 7 pages.

• patent · 20 Sep 1983 · added 2 months ago

  Plasma etching process and apparatus

  Machine transcription of the US4405406A patent scan, 6 pages.

• patent · 14 Sep 1982 · added 2 months ago

  Method and apparatus for plasma etching

  Machine transcription of the US4349409A patent scan, 23 pages.

• patent · 23 Feb 1982 · added 2 months ago

  Device for chemical dry etching of integrated circuits

  Machine transcription of the US4316791A patent scan, 5 pages.

• patent · 1 Sep 1987 · added 2 months ago

  Apparatus and method for plasma treatment of resin material

  Machine transcription of the US4690097A patent scan, 28 pages.

• patent · 12 Oct 1982 · added 2 months ago

  Selective plasma polysilicon etching

  Machine transcription of the US4353777A patent scan, 5 pages.

• patent · 31 Oct 1978 · added 2 months ago

  Gas-etching device

  A gas etching device comprises a vacuum vessel provided with a means for supplying into the vacuum vessel a gas containing therein oxygen atoms and a gas containing therein fluorin...

• patent · 4 Jul 1989 · added 2 months ago

  Ion etching and chemical vapour deposition

• patent · 7 Jul 1992 · added 2 months ago

  Process for the surface treatment of conductive material

• patent · 7 Sep 1993 · added 2 months ago

  Method of and apparatus for synthesizing hard material

• patent · 1 Jun 1976 · added 2 months ago

  Film deposition

  A method and apparatus for depositing a thin film of material upon a base substrate including a glow discharge ion source for generating the particular ions that will be subsequent...

• patent · 21 Oct 1986 · added 2 months ago

  Uniform plasma for drill smear removal reactor

  Machine transcription of the US4618477A patent scan, 12 pages.

• patent · 22 Jun 1993 · added 2 months ago

  Method for reducing foreign matter on a wafer etched in a reactive ion etching process

• patent · 16 Jun 1993 · added 2 months ago

  Methods and apparatus for generating a plasma for "downstream" rapid shaping of surfaces of substrates and films