What’s new

August 2026

• patent · 25 Jan 2007 · added 2 months ago

  Method of depositing a metal seed layer on semiconductor substrates

• patent · 2 Aug 2007 · added 2 months ago

  Damage-free sculptured coating deposition

• patent · 21 Apr 2005 · added 2 months ago

  Method of depositing a metal seed layer on semiconductor substrates

• patent · 3 Jun 2008 · added 2 months ago

  Method of depositing a metal seed layer on semiconductor substrates

• patent · 9 Sep 1986 · added 2 months ago

  Apparatus for processing semiconductor wafers or the like

  Machine transcription of the US4610748A patent scan, 7 pages.

• patent · 21 Oct 1986 · added 2 months ago

  Uniform plasma for drill smear removal reactor

  Machine transcription of the US4618477A patent scan, 12 pages.

• patent · 1 Sep 1987 · added 2 months ago

  Apparatus and method for plasma treatment of resin material

  Machine transcription of the US4690097A patent scan, 28 pages.

• patent · 20 Sep 1983 · added 2 months ago

  Plasma etching process and apparatus

  Machine transcription of the US4405406A patent scan, 6 pages.

• patent · 12 Oct 1982 · added 2 months ago

  Selective plasma polysilicon etching

  Machine transcription of the US4353777A patent scan, 5 pages.

• patent · 14 Sep 1982 · added 2 months ago

  Method and apparatus for plasma etching

  Machine transcription of the US4349409A patent scan, 23 pages.

• patent · 1 Jun 1976 · added 2 months ago

  Film deposition

  A method and apparatus for depositing a thin film of material upon a base substrate including a glow discharge ion source for generating the particular ions that will be subsequent...

• patent · 23 Feb 1982 · added 2 months ago

  Device for chemical dry etching of integrated circuits

  Machine transcription of the US4316791A patent scan, 5 pages.

• patent · 31 Oct 1978 · added 2 months ago

  Gas-etching device

  A gas etching device comprises a vacuum vessel provided with a means for supplying into the vacuum vessel a gas containing therein oxygen atoms and a gas containing therein fluorin...

• patent · 9 May 1989 · added 2 months ago

  Discharge reaction apparatus utilizing dynamic magnetic field

• patent · 3 May 1989 · added 2 months ago

  Apparatus and method for plasma treatment of resin material

• patent · 9 Mar 1989 · added 2 months ago

  Controlled process for the production of thermal energy from gases and apparatus useful therefor

• patent · 28 Feb 1989 · added 2 months ago

  Plasma processing method and apparatus for carrying out the same

• patent · 18 Oct 1988 · added 2 months ago

  Electron cyclotron resonance plasma source

• patent · 17 Jul 1986 · added 2 months ago

  DEVICE FOR PROCESSING SEMICONDUCTOR BOARDS OR THE LIKE

• patent · 8 Jun 1982 · added 2 months ago

  Methods and apparatus for improving an RF excited reactive gas plasma

  Machine transcription of the US4333814A patent scan, 9 pages.

• patent · 4 Jul 1989 · added 2 months ago

  Ion etching and chemical vapour deposition

• patent · 7 Sep 1993 · added 2 months ago

  Method of and apparatus for synthesizing hard material

• patent · 22 Jun 1993 · added 2 months ago

  Method for reducing foreign matter on a wafer etched in a reactive ion etching process

• patent · 16 Jun 1993 · added 2 months ago

  Methods and apparatus for generating a plasma for "downstream" rapid shaping of surfaces of substrates and films

• patent · 9 Feb 1993 · added 2 months ago

  Atomspheric plasma reaction method and apparatus therefor

• patent · 7 Jul 1992 · added 2 months ago

  Process for the surface treatment of conductive material

• patent · 11 Jun 1991 · added 2 months ago

  Electronic component having improved low resistance contact and manufacturing method therefor

• patent · 8 Jan 1991 · added 2 months ago

  Magnetically enhanced RIE process and apparatus

• patent · 17 Apr 1990 · added 2 months ago

  Processes depending on plasma generation using a helical resonator

• patent · 14 Jun 1989 · added 2 months ago

  Method of manufacturing a semiconductor device, in which photoresist on a silicon oxide layer on a semiconductor substrate is stripped